專利國別

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發表日期

2012-06-22 09:44:25

本校案號

P93013A

專利名稱

化學機械研磨製程中藉由偵測研磨界面溫度檢測研磨墊使用狀況及壽命的方法「METHOD OF MONITORING SURFACE STATUS AND LIFE OF PAD BY DETECTING TEMPERATURE OF POLISHING INTERFACE DURING CHEMICAL MECHANICAL PROCESS」

發明人

鄭友仁、黃培堯

所屬院

工學院

提案單位

機械工程學系暨研究所

類型

發明

專利權人

國立中正大學

申請號

11/228,219

申請日期

2005-09-19

公開號

0

公開日期

2007-01-11

證書號

US 7,169,019 B2

核准日期

2007-01-30

國際分類號

B24B-001/00(2006.01)

專利權期間

2005.09.19~2025.09.19

專利摘要

A method of monitoring surface status and life of a pad by detecting temperature of a polishing interface during a CMP process. The method include the steps of preparing and placing a brand-new pad under an artificially controlled environment for several CMP tests until termination of its operational life to conclude a relationship between the last stable temperature-rise at a polishing trace during the CMP process and surface roughness of the pad. Then conducting a polishing test of a subject pad under an artificially controlled environment to conclude a relationship between the last stable temperature-rise at a polishing trace during the CMP process and surface roughness of the subject pad. Comparing the two relationships indicated in the aforesaid two steps for analysis to monitor the surface status and operational life of the subject pad.

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