專利國別

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發表日期

2014-08-14 10:34:03

本校案號

P95012A

專利名稱

低應力拋光裝置「LOW-STRESS POLISHING DEVICE」

發明人

蔡孟勳、鄭友仁

所屬院

工學院

提案單位

機械工程學系暨研究所

類型

發明

專利權人

國立中正大學

申請號

12/071,423

申請日期

2008-02-21

公開號

US20080287045A1

公開日期

2008-11-20

證書號

US 7,695,351 B2

核准日期

2010-03-13

國際分類號

B24B-007/00(2006.01)

專利權期間

2008.02.21~2028.02.21

專利摘要

A low-stress polishing device includes a base;a plurality of actuators mounted to the base and spaced from each other in a predetermined interval,each of the actuators having a drive shaft and a buffer spring connected with the drive shaft for providing the drive shaft with a predetermined impulsive pressure,each of the drive shafts having a buffer pad located at a distal end thereof;at least one drive circuit electrically connected with the actuators for control of driving the actuators;a working plate mounted to the buffer pads;and a polishing pad mounted to the working plate.Accordingly,the vibration mode generated by the device provides a dynamic pressure on the wafer surface for destroying  the chemical product on the wafer surface and is applicable to polishing of low-dielectric integrated copper structures.

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