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【可授權專利公告】P108017US-2D材料檢驗方法

可授權-上隔線

專利國別

  美國   

發表日期

2023-03-27 11:19:05

本校案號

P108017US

專利名稱

2D材料檢驗方法

發明人

王祥辰、李愷竣、柯凱翔、梁俊文

所屬院

工學院

提案單位

機械系

類型

發明

專利權人

國立中正大學

申請號

17/235,302

申請日期

2021.04.20

公開號

US 11,555,996 B2

公開日期

2021.11.11

證書號

US 11,555,996 B2

核准日期

2023.01.17

國際分類號

G02B 21/36(2006.01); G01J 3/28(2006.01); G01J 3/44(2006.01); G01N 21/65(2006.01)

專利權期間

2023.01.17~2041.04.20

專利摘要

A method for analyzing 2D material thin film and a system for analyzing 2D material thin film are disclosed. The detection method includes the following steps: capturing sample images of 2D material thin films; measuring the 2D material thin films by a Raman spectrometer; performing a visible light hyperspectral algorithm on the sample images by a processor to generate a plurality of visible light hyperspectral images; performing a training and validation procedure, performing an image feature algorithm on the visible light hyperspectral images, and establishing a thin film prediction model based on a validation; and capturing a thin-film image to be measured by the optical microscope, performing the visible light hyperspectral algorithm, and then generating a distribution result of the thin-film image to be measured according to an analysis of the thin film prediction model

圖示

108017-US

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