【可授權專利公告】P108023US-電磁波反射結構及其製造方法
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專利國別 |
美國 |
發表日期 |
2023-11-17 11:50:50 |
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本校案號 |
P108023US |
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專利名稱 |
電磁波反射結構及其製造方法「ELECTROMAGNETIC WAVE REFLECTING STRUCTURE AND MANUFACTURING METHOD THEREOF」 |
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發明人 |
張盛富、張嘉展、林士程、陳為暘、林育丞 |
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所屬院 |
工學院 |
提案單位 |
電信研究中心 |
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類型 |
發明 |
專利權人 |
國立中正大學 |
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申請號 |
17/171,342 |
申請日期 |
2021.02.09 |
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公開號 |
US20230361477A1
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公開日期 |
2023.11.09
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證書號 |
US11,777,225 B2 |
核准日期 |
2023.10.03 |
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國際分類號 |
H01Q 15/14(2006.01); H01Q 19/10(2006.01) |
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專利權期間 |
2023.10.03~2041.07.02 |
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專利摘要 |
A manufacturing method of electromagnetic wave reflection structure includes the following steps: presetting an operation frequency, a reflection angle, an incidence angle, and an incidence distance for an electromagnetic wave; obtaining a phase distribution of an electromagnetic wave reflection structure, based on the operation frequency, the reflection angle, the incidence angle, and the incidence distance of the electromagnetic wave; and comparing the phase distribution of the electromagnetic wave reflection structure to a reflection phase curve of a reflection element at the operation frequency, so as to set a plurality of the reflection elements on a substrate accordingly. |
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圖示 |
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