專利國別

  美國  

發表日期

2026-07-09

本校案號

P112014US

專利名稱

多重波束的電磁波反射結構「ELECTROMAGNETIC WAVE REFLECTING STRUCTURE AND MANUFACTURING METHOD THEREOF」

發明人

張盛富、張嘉展、林士程、陳為暘、林育丞

所屬院

工學院

提案單位

電信研究中心

類型

發明

專利權人

國立中正大學

申請號

18/356,470

申請日期

2023.07.21

公開號

US20230361477A1

公開日期

2023.11.09

證書號

US 12,562,497 B2

核准日期

2026.02.24

國際分類號

H01Q 3/46(2013.01); H01Q 15/0013(2013.01); H01Q 15/148(2013.01); H01Q 15/0086(2013.01); H01Q 15/147(2013.01)

專利權期間

2023.11.09~2043.11.09 (延長298天至2044.09.02)

專利摘要

A method of manufacturing an electromagnetic wave reflecting structure includes the steps of presetting an operating frequency, a reflected wave pointing angle, an incident wave pointing angle, and an incident distance of an electromagnetic wave; obtaining an electromagnetic wave reflecting structure phase distribution of an electromagnetic wave reflecting structure according to the operating frequency, the reflected wave pointing angle, the incident wave pointing angle, and the incident distance; and arranging a plurality of reflecting elements on a substrate according to the electromagnetic wave reflecting structure phase distribution and a reflecting element phase curve of any one of the reflecting elements at the operating frequency.

圖示